In-Situ Etching Of Shadow Masks Of A Continuous In

专利名称：In-Situ Etching Of Shadow Masks Of A

Continuous In-Line Shadow Mask VaporDeposition System

发明人：Thomas Peter Brody,Joseph A. Marcanio申请号：US12250150申请日：20081013

公开号：US20090098309A1公开日：20090416

专利附图：

摘要：In a method of using and cleaning one or more shadow masks of a shadow maskvapor deposition system used to form an electronic device, a substrate is advanced

through series connected deposition vacuum vessels. As the substrate advances througheach deposition vacuum vessel, material from a material deposition source positioned inthe deposition vacuum vessel is deposited on the substrate through a shadow maskpositioned therein. The material is also deposited on a surface of the shadow mask thatfaces the one material deposition source. Following the deposit of material on thesurface of the shadow mask in at least one deposition vacuum vessel, a reactive gas isintroduced into the deposition vacuum vessel absent the substrate therein. The reactivegas is then ionized to remove the material deposited on the shadow mask.

申请人：Thomas Peter Brody,Joseph A. Marcanio

地址：Pittsburgh PA US,Greensburg PA US

国籍：US,US

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