HIGH REPETITION RATE EXCIMER LASER SYSTEM

专利名称：HIGH REPETITION RATE EXCIMER LASER

SYSTEM

发明人：ROBERT W SPARROW,PAUL M

THEN,MICHAEL A PELL,CHARLENE M SMITH

申请号：AU2003223174申请日：20030212公开号：AU2003223174A1公开日：20030904

摘要：The invention provides a >=4 kHz repetition rate fluoride excimer laser systemfor producing an UV wavelength <200 nm, and in particular an argon fluoride excimerlaser system for producing a UV wavelength 193 nm output. The >=4 kHz repetition rateargon fluoride excimer laser system includes an argon fluoride excimer laser chamber forproducing a 193 nm discharge at a pulse repetition rate >=4 kHz. The >=4 kHzrepetition rate argon fluoride excimer laser chamber also includes magnesium fluoridecrystal optic windows for outputting the 193 nm discharge as a >=4 kHz repetition rateexcimer laser 193 nm output with the magnesium fluoride crystal optic windows having a255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulsesof 193 nm light at a fluence >=40 mj/cm2/pulse and a 42 mm crystal 120 nm transmissionof at least 30%.

申请人：CORNING INCORPORATED

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