Nitrogen-containing organic compound, resist compo

专利名称：Nitrogen-containing organic compound,

resist composition and patterning process

发明人：Takeru Watanabe,Takeshi Kinsho,Koji

Hasegawa,Katsuya Takemura,KazumiNoda,Katsuhiro Kobayashi

申请号：US10984933申请日：20041110公开号：US07276324B2公开日：20071002

摘要：Chemically amplified resist compositions comprising nitrogen-containingorganic compounds having an aromatic carboxylic acid ester structure have an excellentresolution and provide a precise pattern profile and are useful in microfabrication usingelectron beams or deep-UV light.

申请人：Takeru Watanabe,Takeshi Kinsho,Koji Hasegawa,Katsuya Takemura,KazumiNoda,Katsuhiro Kobayashi

地址：Niigata-ken JP,Niigata-ken JP,Niigata-ken JP,Niigata-ken JP,Niigata-kenJP,Niigata-ken JP

国籍：JP,JP,JP,JP,JP,JP

代理机构：Birch, Stewart, Kolasch & Birch, LLP

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