Lithographic apparatus, aberration detector and de

专利名称：Lithographic apparatus, aberration detector

and device manufacturing method

发明人：Wilhelmus Jacobus Maria Rooijakkers申请号：US13169666申请日：20110627公开号：US08760625B2公开日：20140624

专利附图：

摘要：An aberration detector for a lithographic apparatus is used. An imaging devicecaptures an image of at least one pinhole feature of a target projected onto the imagingdevice by the projection system of the lithographic apparatus at two different locations

separated in a direction parallel to the optical axis of the projection system. A controllerobtains a representation of the aberration of the projection system from the capturedimages.

申请人：Wilhelmus Jacobus Maria Rooijakkers

地址：Waalre NL

国籍：NL

代理机构：Sterne, Kessler, Goldstein & Fox P.L.L.C.

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