专利名称：Pattern detector
发明人：Terasawa, Tsuneo,Kuniyoshi, Shinji,Takanashi,
Akihiro,Kurosaki, Toshiei,Kawamura,Yoshio,Hosaka, Sumio
申请号：EP83110336.1申请日：19831017公开号：EP0106346A1公开日：19840425
专利附图：
摘要：A pattern detector according to the present invention adopts a processingmethod wherein means is provided anew with which the intensity distribution of lightreflected from or transmitted through an illuminated specimen is photoelectricallyconverted, and a pattern position is detected at high speed from the ratio between theprimary moment and integral value of a detection signal thus derived, whereupon asymmetry calculation is executed within a narrow range around the detected value,
whereby the pattern position is found fast and precisely.
申请人：HITACHI, LTD.
地址：6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 100 JP
国籍：JP
代理机构：Altenburg, Udo, Dipl.-Phys.
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