Developing method and developing apparatus

专利名称：Developing method and developing

apparatus

发明人：Takayuki Toshima,Tsutae Omori,Yoshio

Kimura

申请号：US10108382申请日：20020329

公开号：US20020122670A1公开日：20020905

专利附图：

摘要：A solution having a photosensitive radical is applied onto a resist film, adeveloping solution is applied thereonto, and the entire surface of the solution having

the photosensitive radical is exposed all at once. Developing of the resist film progressesall at once after a coating film of the solution having the photosensitive radical dissolvesin the developing solution, and hence time difference in the start time of developing doesnot occur in the surface of a substrate, thereby enabling uniform developing and animprovement in line width uniformity (CD value uniformity) in the surface of the substrate.

申请人：TOSHIMA TAKAYUKI,OMORI TSUTAE,KIMURA YOSHIO

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