专利名称：STRUCTURE MANUFACTURING METHOD
AND STRUCTURE
发明人：Shin Masuhara申请号：US13212520申请日：20110818
公开号：US20120052260A1公开日：20120301
专利附图：
摘要：A structure manufacturing method includes laminating a first film on a basematerial, selectively irradiating the first film with an energy ray depending on a positionof a surface of the first film on the base material, to form a latent image of a pattern on
the first film, laminating a second film on the surface of the first film, and supplying adeveloper to the second film and removing a removal target portion of the first film tobe selectively removed along with the second film, thereby developing the pattern.
申请人：Shin Masuhara
地址：Tokyo JP
国籍：JP
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