专利名称：Quality control system, quality control
method, and method of lot-to-lot waferprocessing
发明人：Akira Ogawa,Yukihiro Ushiku,Tomomi Ino申请号：US11395276申请日：20060403
公开号：US20060235560A1公开日：20061019
专利附图：
摘要：A quality control system has: a QC value storage unit that stores QC actualmeasurements of past lots, a data acquisition device that acquires the device internal
information of a processing device processing an intended lot, a device internal
information storage unit that stores the device internal information, a recipe storage unitthat stores a plurality of recipes classified by the distribution of sampling density within awafer, a QC value prediction unit that predicts a QC prediction value of the intended lotusing the device internal information and the QC actual measurements, a waferdetermination unit that determines a sample wafer to be measured from among aplurality of wafers constituting the intended lot using the QC prediction value, a recipeselection unit that selects an application recipe to be applied to the sample wafer fromamong the plurality of recipes using the QC prediction value, and a measurement devicethat makes a QC measurement on the sample wafer using the application recipe andstores the measurement result in the QC value storage unit.
申请人：Akira Ogawa,Yukihiro Ushiku,Tomomi Ino
地址：Kanagawa-ken JP,Kanagawa-ken JP,Kanagawa-ken JP
国籍：JP,JP,JP
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容