专利名称：APPARATUS AND MEASUREMENT
PROCEDURE FOR THE FAST, QUANTITATIVE,NON-CONTACT TOPOGRAPHICINVESTIGATION OF SEMICONDUCTORWAFERS AND OTHER MIRROR LIKESURFACES
发明人：LUKACS, István, Endre,MAKAI, János,RIESZ,
Ferenc,SZENTPALI, Béla,PFITZNER, Lothar
申请号：EP02785145.0申请日：20021001公开号：EP1434981A1公开日：20040707
摘要：the object of the invention is, on the one hand, and
m\ást\ük\örjelleg\ű surfaces of semiconductor wafers
\érint\ésmentes, fast quantitative measurement system which is suitable fortopogr\áfiaivizsg\álat\ára, 4.figure szerint\ábr\ázolt manner,point light source, the light source (1) and the
f\ény\étp\árhuzamos\ít\ó kollim\ált beam of light to thetest area vet\ít\őhomor\ú mirror (4),the light source and the mirrorelhelyezettstruktur\ált between mask patterns (3) and the test surface.then, theconcave mirror in the path of beam of light reflected eztk\övet\ően
helyezettk\ép\érz\ékel\ő contains sensor (6).the szenzorhoz suitableinterface (7) is connected by means of a computer (8), (9) which, on the one hand,
ahozz\ácsatlakoz\ó monitor displays the sensor by
\érz\ékeltk\épet,on the other hand, suitable for maszkk\épelemeinekalgorithm determines the sensor surface formed in a position.the invention
t\árgyam\ásr\észt measurement procedure, which in the above describedarrangement \ésalkalmas algorithm f\élvezet\őszeletek and othert\ük\örjelleg\űfel\ületek \érint\ésmentes,a rapid quantitativetopographical vizsg\álat\áraalkalmas.the essence of the invention is that themask and the other element relative to the position of the szenzornak i got elected tothe mask essentially sharp optical image of aszenzoron appear.the advantage ofatal\álm\ány increased lateral resolution, accuracy \ésdinamikai province.oh
申请人：Hungarian Academy of Sciences Research Institute for Technical Physics andMaterials Science,FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DERANGEWANDTENFORSCHUNG E.V.
地址：Konkoly-Thege ut 29-33 1121 Budapest HU,Leonrodstrasse 54 80636 MünchenDE
国籍：HU,DE
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