您好,欢迎来到筏尚旅游网。
搜索
您的当前位置:首页Method of producing semiconductor wafer

Method of producing semiconductor wafer

来源:筏尚旅游网
专利内容由知识产权出版社提供

专利名称:Method of producing semiconductor wafer发明人:Yoichi Togashi申请号:US08/578027申请日:19951226公开号:US057453A公开日:19980428

摘要:A system for producing a semiconductor wafer includes a production progresscomparing/calculating unit, a fabrication device status monitor step, an inventory controlstep, and a process shelf controller step. In response to a timing signal from thefabrication device status monitor step, the production progress comparing/calculatingunit determines a semiconductor wafer to be processed next, and the determinedsemiconductor wafer is automatically searched for on a process shelf. The fabricationdevices of a semiconductor wafer production line start processing semiconductor wafersat suitable times thereby producing semiconductor wafers according to a productionplan and meeting a delivery time for the semiconductor wafers.

申请人:NEC CORPORATION

代理机构:Sughrue, Mion, Zinn, Macpeak & Seas, PLLC

更多信息请下载全文后查看

因篇幅问题不能全部显示,请点此查看更多更全内容

Copyright © 2019- efsc.cn 版权所有 赣ICP备2024042792号-1

违法及侵权请联系:TEL:199 1889 7713 E-MAIL:2724546146@qq.com

本站由北京市万商天勤律师事务所王兴未律师提供法律服务