Multiple focus X-ray generator

专利名称：Multiple focus X-ray generator发明人：Walter Weigl,Ulf Bergman,Lennart Baum申请号：US06/092285申请日：19791108公开号：US04266133A公开日：19810505

摘要：An X-ray generator has at least a first and a second cathode filament foremitting electrons, one end of the first filament being connected to one end of thesecond filament, the connection point forming a terminal. Still two further terminals arelocated at the ends of the serial connection of the two filaments. Two of the threeterminals are connected via a diode in each connection line to the first pole of a d-csource, while the third terminal is coupled to the second pole of the d-c source. Bothdiodes are oppositely poled. The polarity of the d-c voltage supplied by the d-c sourcecan be changed, for example, by a remote reversing switch. The polarity of the d-c sourcedetermines which and how many filaments are energized to provide focal spots ofdifferent size. Since two supply lines are sufficient in a high-voltage cable for feeding thefirst and second filaments, a third line in the cable can be used for the supply of a thirdheating filament. This third filament may be coupled to one of the three terminals. Thus atriple focus X-ray generator which requires only three supply lines can be obtained. Alsoquadruple and higher focus X-ray generators may be obtained.

申请人：SIEMENS CORPORATION

代理机构：Spellman, Joel & Pelton

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