专利名称：Power coupling for high-power sputtering发明人：Richard Newcomb,Michael Geisler申请号：US108206申请日：20040408
公开号：US20050224343A1公开日：20051013
专利附图：
摘要：A system and method for coating a substrate is described. One embodimentincludes a high-power sputtering system with a power coupler configured to deliverpower to a rotatable target. The power coupler is positioned in a vacuum chamber orbetween the bearings and the rotatable target outside the vacuum chamber to limit the
current that flows through the bearing.
申请人：Richard Newcomb,Michael Geisler
地址：Johnstown CO US,Wachtersbach DE
国籍：US,DE
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